MVU TM Magna - compact vacuum magnetron sputtering deposition machine.

Deposition of metal films (AI, Ni, Fe, W, etc.) and dielectric (SiO2, Si3N4, etc.) by magnetron sputtering.


  • Sequential processing of substrates in one cycle:
    • 2 substrates of ø150mm
    • 4 substrates of ø76mm, ø100mm
    • 8 substrates of ø60mm, 60×48mm
  • sputtering target in the plasma of magnetron discharge
  • preparation of substrate surfaces - heat treatment and ion cleanse in RF discharge plasma
  • automated control from the PC
  • compact oil-free vacuum pumping system
  • autonomous water-cooling system
  • power consumption of less than 3 kW
  • space occupied by one unit is about 1,5m²

MVU TM Magna reactor scheme

MVU TM Magna magnetron sputtering deposition reactor scheme

  • vacuum chamber
  • planetary substrate holder with triple rotation system
  • cylindrical valve rotating screen
  • magnetron sputtering device (magnetron)
  • RF generator
  • vacuum system based on turbo molecular and fore-vacuum pumps
  • gas system includes gas flow regulators RWG-10, manual stop valves, pressure regulators, pressure gauges, solenoid valves
  • water cooling system
  • microprocessor controlled system

MVU TM Magna reactor madifications

MVU TM Magna x2 magnetron sputtering reactor with two magnetrons scheme
MVU TM Magna x3 magnetron sputtering reactor with three magnetrons scheme

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