MVU TM TIS - compact vacuum chemical vapor deposition (CVD) machine.

Metal film deposition by vacuum chemical vapor deposition.


  • Sequential processing of substrates in one cycle:
    • 2 substrates of ø150mm
    • 4 substrates of ø76mm, ø100mm
    • 8 substrates of ø60mm, 60×48mm
  • processes of metal films deposition in high vacuum
  • preparation of substrate surfaces - heat treatment and ion cleanse in RF discharged plasma
  • automated control from the PC
  • compact oil-free vacuum pumping system
  • autonomous water cooling system
  • power consumption of less than 3 kW.
  • space occupied by one unit is about 1,5m²

MVU TM TIS reactor scheme

MVU TM TIS vacuum chemical vapor deposition reactor scheme

  • vacuum chamber
  • planetary substrate holder with triple rotation system
  • cylindrical valve rotating screen
  • resistive vaporizer
  • vaporizer power supply
  • vacuum system based on turbo molecular and fore-vacuum pumps;
  • gas system includes gas flow regulators RWG-10, manual stop valves, pressure regulators, pressure gauges, solenoid valves
  • water cooling system
  • microprocessor control system

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