220033, Republic of Belarus, Minsk, 2 Partizansky Ave.


Wafer Stepper EM-5084B

The principle of operation consists in sequential transfer (step-and-repeat) of the reduced in size reticle image onto a prefocused, aligned with the reticle image plane semiconductor wafer, oriented by alignment marks applied to its working surface.


EM-5084B consists of the following units:

  • Control unit
  • X,Y stage with a three-coordinate laser measuring system based on interferometers
  • Focusing and leveling system
  • Image analysis system (IAS)
  • Reticle-to-wafer photoelectric alignment system
  • Projection system, including 5x projection lens, illumination unit and light energy dose system
  • Wafer loading unit
  • Reticle loading unit

The alignment can be carried out in two ways:

  • global alignment by 2, 4, 9, 16 and 25 marks
  • die-to-die alignment

The machine is equipped with an automatic system of reticle loading onto the working position from special dust-proof containers of Entegris company.

Operating wavelength404 nm
Reduction ratio1.5
Maximum working field16 x 16 mm
Minimum feature size0.8 m
Alignment accuracy 0.1 m
Wafer diameter150 mm, 200mm
Reticle size127 x 127 mm
Reticle library capacity12 ps.
Throughput (wafer diameter 150 mm)45 wafers/hour
Weight2900 kg
Operating Conditions
Clean room:-
Machine unitClass 10
Control systemClass 10 000
Power requirements220 V, 50 Hz
Power consumption3,5 kW
Footprint13 m2 (5 m2 in Class 10 clean room, 8 m2 in Class 10 000 clean room)

Made in Zelenograd

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